Extreme ultraviolet (EUV) lithography is at the center of next-generation semiconductor manufacturing as it enables smaller ...

Extreme ultraviolet lithography extends photolithography to ... features beyond the capabilities of today's 193 nm systems. For example, so-called double-patterning techniques involve splitting ...

Extreme-ultraviolet (EUV) lithography at 13.5 nm is expected to be introduced in high-volume semiconductor chip production over the next three years. Research is now underway to investigate sub-10 ...